HUMANITYVECTOR

Why it matters, product

Lithography tools

Scanners that print circuit patterns onto wafers; extreme ultraviolet tools at the leading edge come from one supplier.

Depends on
0
Depended on by
1
Metrics
0

Neighbourhood: what depends on it (left), what it depends on (right)

Dependencies around Lithography toolssemiconductor-fab requires input lithography-tools: Established relationSemiconductorfabrication plantLithography tools
  • Candidate
  • Hypothesized
  • Mechanism supported
  • Causally supported
  • Established relation

Systems that would feel a shortage

Downstream: what depends on it

weakest edge Established relation
  1. Semiconductor fabrication plant requires input Lithography tools2 evidenceEstablished relation

    Semiconductor fabrication plant depends on Lithography tools.

    Mechanism

    Patterning at leading-edge nodes uses extreme ultraviolet scanners from a single supplier; fab capacity is bounded by tool deliveries.

    Evidence

    Status
    established_identity_or_engineering_relation
    Reviewer confidence
    0.98
    Stated strength
    1.00
    Lag
    not stated
    Version
    curated_seed_v1
    Reviewed
    2026-09-07

    Confidence and strength are curated judgements recorded with the edge, not measured quantities.

    evidence and analysis for this edge

Inputs it cannot do without

Upstream: what it depends on

No stored inputs for this entity.

Measured, from the catalog

Linked metrics

Current value for the metric's default geography. Values come from the metric pages, not from the graph.

No catalog metric is linked to this entity yet.

Named on the edges that depend on it

Substitutes

No substitute is named for this entity on any stored edge.

Derived from curated edges

Bottleneck centrality

centrality_v1Derived
Score
4.75
Downstream entities
6
Direct dependents
1

Sum over every entity downstream (within six hops) of the strongest path weight to it, where each edge weighs its stated strength divided by one plus its named substitutes. A graph statistic over curated edges, not an observation. Computed 2026-09-07 22:42 UTC.

Curated paths this entity is part of

Chains

Names that resolve to this node

Aliases

  • EUV lithography
  • EUV scanner
  • lithography equipment
  • photolithography equipment

slug lithography-tools, updated 2026-09-07 22:42 UTC